Workshop Facility Layout Optimization Based on Deep Reinforcement Learning

被引:0
|
作者
Zhao, Yanlin [1 ]
Duan, Danlu [1 ]
机构
[1] Panzhihua Univ, Intelligent Mfg Coll, Panzhihua 617000, Peoples R China
关键词
facility layout optimization; dual-objective problem; deep reinforcement learning; chip production workshop; virtual reality technology; DESIGN;
D O I
10.3390/pr12010201
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
With the rapid development of intelligent manufacturing, the application of virtual reality technology to the optimization of workshop facility layout has become one of the development trends in the manufacturing industry. Virtual reality technology has put forward engineering requirements for real-time solutions to the Workshop Facility Layout Optimization Problem (WFLOP). However, few scholars have researched such solutions. Deep reinforcement learning (DRL) is effective in solving combinatorial optimization problems in real time. The WFLOP is also a combinatorial optimization problem, making it possible for DRL to solve the WFLOP in real time. Therefore, this paper proposes the application of DRL to solve the dual-objective WFLOP. First, this paper constructs a dual-objective WFLOP mathematical model and proposes a novel dual-objective DRL framework. Then, the DRL framework decomposes the WFLOP dual-objective problem into multiple sub-problems and then models each sub-problem. In order to reduce computational workload, a neighborhood parameter transfer strategy is adopted. A chain rule is constructed for the appealed sub-problem, and an improved pointer network is used to solve the bi-objective WFLOP of the sub-problem. Finally, the effectiveness of this method is verified by using the facility layout of a chip production workshop as a case study.
引用
收藏
页数:14
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