Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

被引：8
|
作者：
Renner, M. [1 ,2 ]
Fischer, J. [1 ,3 ]
Hajihoseini, H. [4 ]
Gudmundsson, J. T. [5 ,6 ]
Rudolph, M. [7 ]
Lundin, D. [1 ]
机构：
[1] Linkoping Univ, Dept Phys Chem & Biol IFM, Plasma & Coatings Phys Div, SE-58183 Linkoping, Sweden
[2] Rhein Westfal TH Aachen, DE-52062 Aachen, Germany
[3] Evatec AG, Hauptstr 1a, CH-9477 Trubbach, Switzerland
[4] Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, NL-7522 Enschede, Netherlands
[5] KTH Royal Inst Technol, Sch Elect Engn & Comp Sci, Div Space & Plasma Phys, SE-10044 Stockholm, Sweden
[6] Univ Iceland, Sci Inst, IS-107 Reykjavik, Iceland
[7] Leibniz Inst Surface Engn IOM, DE-04318 Leipzig, Germany
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2023年 / 41卷 / 03期
基金：
瑞典研究理事会;
关键词：
PHYSICAL VAPOR-DEPOSITION; IONIZED FLUX FRACTION; HIPIMS DISCHARGES; ATOMS; IONIZATION; ENERGY; YIELDS; TI; TECHNOLOGY; COATINGS;
D O I：
10.1116/6.0002555
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The angular dependence of the deposition rates due to ions and neutrals in high-power impulse magnetron sputtering (HiPIMS) discharges with a titanium target were determined experimentally using a magnetically shielded and charge-selective quartz crystal microbalance (or ionmeter). These rates have been established as a function of the argon working gas pressure, the peak discharge current density, and the pulse length. For all explored cases, the total deposition rate exhibits a heart-shaped profile and the ionized flux fraction peaks on the discharge axis normal to the cathode target surface. This heart-shaped pattern is found to be amplified at increasing current densities and reduced at increased working gas pressures. Furthermore, it is confirmed that a low working gas pressure is beneficial for achieving high deposition rates and high ionized flux fractions in HiPIMS operation.
引用
收藏
页数：18
相关论文
共 50 条
  • [1] Velocity distribution of titanium neutrals in the target region of high power impulse magnetron sputtering discharges
    Held, J.
    Hecimovic, A.
    von Keudell, A.
    Schulz-von der Gathen, V
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2018, 27 (10):
  • [2] An ionization region model for high-power impulse magnetron sputtering discharges
    Raadu, M. A.
    Axnas, I.
    Gudmundsson, J. T.
    Huo, C.
    Brenning, N.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (06):
  • [3] The statistics of spoke configurations in high-power impulse magnetron sputtering discharges
    Klein, P.
    Hnilica, J.
    Zemanek, M.
    Bradley, J. W.
    Vasina, P.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2019, 52 (12)
  • [4] Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges
    Kozak, Tomas
    Vlcek, Jaroslav
    Kos, Simon
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (10)
  • [5] Titanium oxide thin films deposited by high-power impulse magnetron sputtering
    Konstantinidis, S.
    Dauchot, J. P.
    Hecq, A.
    [J]. THIN SOLID FILMS, 2006, 515 (03) : 1182 - 1186
  • [6] High-power impulse magnetron sputtering and its applications
    Ehiasarian, Arutiun P.
    [J]. PURE AND APPLIED CHEMISTRY, 2010, 82 (06) : 1247 - 1258
  • [7] Film characterization of titanium oxide films prepared by high-power impulse magnetron sputtering
    Jing, F. J.
    Yukimura, K.
    Kato, H.
    Lei, Y. F.
    You, T. X.
    Leng, Y. X.
    Huang, N.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2011, 206 (05): : 967 - 971
  • [8] Titanium film deposition by high-power impulse magnetron sputtering: Influence of pulse duration
    Jing, F. J.
    Yin, T. L.
    Yukimura, K.
    Sun, H.
    Leng, Y. X.
    Huang, N.
    [J]. VACUUM, 2012, 86 (12) : 2114 - 2119
  • [9] Modeling of high power impulse magnetron sputtering discharges with graphite target
    Eliasson, H.
    Rudolph, M.
    Brenning, N.
    Hajihoseini, H.
    Zanaska, M.
    Adriaans, M. J.
    Raadu, M. A.
    Minea, T. M.
    Gudmundsson, J. T.
    Lundin, D.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2021, 30 (11):
  • [10] Arc energy minimization in high-power impulse magnetron sputtering
    Oskirko, V. O.
    Semenov, V. D.
    Solovyev, A. A.
    Rabotkin, S., V
    Pavlov, A. P.
    Zakharov, A. N.
    [J]. VACUUM, 2022, 202
12345