Update to RIFM fragrance ingredient safety assessment, myrcenol, CAS Registry Number 543-39-5

被引：0

作者：

Api, A. M. ^{[1
]}

Belsito, D. ^{[2
]}

Botelho, D. ^{[1
]}

Bruze, M. ^{[3
]}

Burton, A., Jr. ^{[4
]}

Cancellieri, M. A. ^{[1
]}

Chon, H. ^{[1
]}

Dagli, M. L. ^{[5
]}

Dekant, W. ^{[6
]}

Deodhar, C. ^{[1
]}

Fryer, A. D. ^{[7
]}

Jones, L. ^{[1
]}

Joshi, K. ^{[1
]}

Kumar, M. ^{[1
]}

Lapczynski, A. ^{[1
]}

Lavelle, M. ^{[1
]}

Lee, I. ^{[1
]}

Liebler, D. C. ^{[8
]}

Moustakas, H. ^{[1
]}

Muldoon, J. ^{[1
]}

Penning, T. M. ^{[9
]}

Ritacco, G. ^{[1
]}

Romine, J. ^{[1
]}

Sadekar, N. ^{[1
]}

Schultz, T. W. ^{[10
]}

Selechnik, D. ^{[1
]}

Siddiqi, F. ^{[1
]}

Sipes, I. G. ^{[11
]}

Sullivan, G. ^{[1
]}

Thakkar, Y. ^{[1
]}

Tokura, Y. ^{[12
]}

机构：

[1] Res Inst Fragrance Mat Inc, 50 Tice Blvd, Woodcliff Lake, NJ 07677 USA

[2] Columbia Univ, Dept Dermatol, Fragrance Safety, Med Ctr, 161 Ft Washington Ave, New York, NY 10032 USA

[3] Malmo Univ Hosp, Dept Occupat & Environm Dermatol, Fragrance Safety, Sodra Forstadsgatan 101,Entrance 47, SE-20502 Malmo, Sweden

[4] Univ Michigan, Sch Nat Resources & Environm, Fragrance Safety, Dana Bldg G110,440 Church St, Ann Arbor, MI 58109 USA

[5] Univ Sao Paulo, Sch Vet Med & Anim Sci, Dept Pathol, Fragrance Safety, Ave Prof dr Orlando Marques Paiva 87, BR-05508900 Sao Paulo, Brazil

[6] Univ Wurzburg, Dept Toxicol, Fragrance Safety, Versbacher Str 9, D-97078 Wurzburg, Germany

[7] Oregon Hlth & Sci Univ, Fragrance Safety, 3181 SW Sam Jackson Pk Rd, Portland, OR 97239 USA

[8] Vanderbilt Univ, Dept Biochem, Ctr Mol Toxicol, Fragrance Safety,Sch Med, 638 Robinson Res Bldg,2200 Pierce Ave, Nashville, TN 37232 USA

[9] Univ Penn, Perelman Sch Med, Ctr Excellence Environm Toxicol, Fragrance Safety, 1316 Biomed Res Bldg BRB II III,421 Curie Blvd, Philadelphia, PA 19104 USA

[10] Univ Tennessee, Dept Comparat Med, Coll Vet Med, Fragrance Safety, 2407 River Dr, Knoxville, TN 37996 USA

[11] Univ Arizona, Dept Pharmacol, Coll Med, Fragrance Safety, 1501 North Campbell Ave,POB 245050, Tucson, AZ 85724 USA

[12] Hamamatsu Univ Sch Med, Dept Dermatol, Fragrance Safety, Journal Dermatol Sci JDS,Higashi Ku, 1-20-1 Handayama, Hamamatsu, Shizuoka 4313192, Japan

来源：

FOOD AND CHEMICAL TOXICOLOGY | 2023年 / 182卷

关键词：

PERSONAL CARE; BETA-MYRCENE; DEVELOPMENTAL TOXICITY; CONSUMER EXPOSURE; MODEL; CLASSIFICATION; ABSORPTION; COSMETICS; THRESHOLD;

D O I：

10.1016/j.fct.2023.114061

中图分类号：

TS2 [食品工业];

学科分类号：

0832 ;

摘要：

引用

页数：13

共 50 条

[1] Update to RIFM fragrance ingredient safety assessment, myrcenol, CAS Registry Number 543-39-5
Api, A. M.
Belsito, D.
Botelho, D.
Bruze, M.
Burton, G. A.
Cancellieri, M. A.
Chon, H.
Dagli, M. L.
Dekant, W.
Deodhar, C.
Fryer, A. D.
Jones, L.
Joshi, K.
Kumar, M.
Lapczynski, A.
Lavelle, M.
Lee, I.
Liebler, D. C.
Moustakas, H.
Muldoon, J.
Penning, T. M.
Ritacco, G.
Romine, J.
Sadekar, N.
Schultz, T. W.
Selechnik, D.
Siddiqi, F.
Sipes, I. G.
Sullivan, G.
Thakkar, Y.
Tokura, Y.
FOOD AND CHEMICAL TOXICOLOGY, 2023, 182
[2] RIFM fragrance ingredient safety assessment, myrcenol, CAS Registry Number 543-39-5
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La Cava, S.
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O'Brien, D.
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Ritacco, G.
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[3] Update to RIFM fragrance ingredient safety assessment, α-methylcinnamaldehyde, CAS Registry Number 101-39-3
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[4] RIFM fragrance ingredient safety assessment, a-methylbenzyl isobutyrate, CAS Registry Number 7775-39-5
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[5] Update to RIFM fragrance ingredient safety assessment, α-methylbenzyl acetate, CAS Registry Number 93-92-5
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[6] Update to RIFM fragrance ingredient safety assessment, linalyl cinnamate, CAS registry number 78-37-5
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[7] Update to RIFM fragrance ingredient safety assessment, linalyl cinnamate, CAS registry number 78-37-5
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[8] Update to RIFM fragrance ingredient safety assessment, cyclohexanecarboxylic acid, CAS Registry Number 98-89-5
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[9] Update to RIFM fragrance ingredient safety assessment, methylcyclooctyl carbonate, CAS Registry Number 61699-38-5
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Botelho, D.
Bruze, M.
Burton, G. A., Jr.
Buschmann, J.
Cancellieri, M. A.
Dagli, M. L.
Date, M.
Dekant, W.
Deodhar, C.
Fryer, A. D.
Jones, L.
Joshi, K.
Kumar, M.
Lapczynski, A.
Lavelle, M.
Lee, I
Liebler, D. C.
Moustakas, H.
Na, M.
Penning, T. M.
Ritacco, G.
Romine, J.
Sadekar, N.
Schultz, T. W.
Selechnik, D.
Siddiqi, F.
Sipes, I. G.
Sullivan, G.
Thakkar, Y.
Tokura, Y.
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