Oxygen-Induced Residual Stress Reduction of Cubic Boron Nitride Films: Reinterpretation of Ye's Results Considering Interfacial Turbostratic Boron Nitride Layer (vol 29, pg 575, 2023)

被引:0
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作者
Choi, Young-Hwan [1 ,2 ]
Huh, Joo-Youl [2 ]
Baik, Young-Joon [1 ]
机构
[1] Korea Inst Sci & Technol, Elect Mat Res Ctr, Seoul 02792, South Korea
[2] Korea Univ, Dept Mat Sci & Engn, Seoul 02841, South Korea
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D O I
10.1007/s12540-022-01385-4
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:1854 / 1854
页数:1
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