Characterization and Modeling of I-V, C-V and Trapping behavior of SiC Power MOSFETs

被引:0
|
作者
Nazir, Mohammmad Sajid [1 ]
Pampori, Ahtisham [1 ]
Zarkob, Yawar Hayat [1 ]
Kar, Anirban [1 ]
Chauhan, Yogesh Singh [1 ]
机构
[1] Indian Inst Technol Kanpur, Dept Elect Engn, Kanpur 208016, Uttar Pradesh, India
关键词
Charge-Based Model; Drift Region; Kink; Power Mosfet; Silicon Carbide and Trapping;
D O I
10.1109/JCS57290.2023.10102944
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a physics-based model to capture the current-voltage (I-V) and capacitance-voltage (C-V) of multiple commercially available Silicon Carbide (SiC) MOSFETs. A chargebased core model has been developed to capture the I-V characteristics of the devices. The parasitic charges and capacitances are modeled empirically to capture the C-V characteristics and kink in the gatedrain capacitance (CGD). To study the trapping behavior, dual-pulse trap characterization is performed for multiple gate and drain quiescent conditions. A positive shift in threshold voltage (VTH) with VGSQ is observed. Further, an RC network approach is implemented to model stress-induced changes in the I-V characteristics of the device.
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页数:3
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