Large-scale, and high-throughput produced devices with strong ultrabroadband absorption and high angular tolerance are in demand for applications such as thermal imaging, energy harvesting, and radiative cooling. Despite long-standing efforts in design and fabrication, it has been challenging to achieve all these desired properties simultaneously. Here, we create a metamaterial-based infrared absorber fabricated from thin films of epsilon-near-zero (ENZ) materials grown on metal-coated patterned silicon substrates that exhibit ultrabroadband infrared absorption in both p-and s-polarization at angles ranging from 0 degrees to 40 degrees. The results show that the structured multilayered ENZ films exhibit high absorption (> 0.9) covering the entire 8 similar to 14 mu m wavelengths. In addition, the structured surface can be realized via scalable, low-cost methods on large-area substrates. Overcoming the limitations on angular and polarized response improves performance for applications such as thermal camouflage, radiative cooling for solar cell, thermal image and et., al. (c) 2023 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
