Optical properties of black silicon structures ALD-coated with Al2O3

被引：4
|
作者：
Schmelz, David [1 ]
Gerold, Kristin [1 ,2 ]
Kaesebier, Thomas [1 ]
Sergeev, Natali [1 ]
Szeghalmi, Adriana [1 ,2 ]
Zeitner, Uwe D. [1 ,2 ]
机构：
[1] Friedrich Schiller Univ Jena, Abbe Ctr Photon, Inst Appl Phys, Jena, Germany
[2] Fraunhofer Inst Appl Opt & Precis Engn IOF, Jena, Germany
来源：
NANOTECHNOLOGY | 2023年 / 34卷 / 01期
关键词：
black silicon; Al2O3; atomic layer deposition; antireflective structures; light trapping; THIN-FILMS; OXIDES;
D O I：
10.1088/1361-6528/ac9419
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Atomic layer deposited (ALD) Al2O3 coatings were applied on black silicon (b-Si) structures. The coated nanostructures were investigated regarding their reflective and transmissive behaviour. For a systematic study of the influence of the Al2O3 coating, ALD coatings with a varying layer thickness were deposited on three b-Si structures with different morphologies. With a scanning electron microscope the morphological evolution of the coating process on the structures was examined. The optical characteristics of the different structures were investigated by spectral transmission and reflection measurements. The usability of the structures for highly efficient absorbers and antireflection (AR) functionalities in the different spectral regions is discussed.
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页数：9
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