Machine learning to optimize additive manufacturing for visible photonics

被引:1
|
作者
Lininger, Andrew [1 ]
Aththanayake, Akeshi [1 ]
Boyd, Jonathan [1 ]
Ali, Omar [1 ]
Goel, Madhav [1 ]
Jizhe, Yangheng [1 ]
Hinczewski, Michael [1 ]
Strangi, Giuseppe [1 ,2 ,3 ]
机构
[1] Case Western Reserve Univ, Dept Phys, 2076 Adelbert Rd, Cleveland Hts, OH 44106 USA
[2] Univ Calabria, Arcavacata Di Rende, CS, Italy
[3] CNR, Inst Nanotechnol, Arcavacata Di Rende, CS, Italy
关键词
additive manufacturing; machine learning; nanophotonics; physics-informed machine learning; two-photon polymerization; ELECTRON-BEAM LITHOGRAPHY; INFORMED NEURAL-NETWORKS; INVERSE DESIGN; UNCERTAINTY QUANTIFICATION; NANOPHOTONICS; MICROFABRICATION; POLYMERIZATION; ALGORITHM; OPTICS; ENERGY;
D O I
10.1515/nanoph-2022-0815
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Additive manufacturing has become an important tool for fabricating advanced systems and devices for visible nanophotonics. However, the lack of simulation and optimization methods taking into account the essential physics of the optimization process leads to barriers for greater adoption. This issue can often result in sub-optimal optical responses in fabricated devices on both local and global scales. We propose that physics-informed design and optimization methods, and in particular physics-informed machine learning, are particularly well-suited to overcome these challenges by incorporating known physics, constraints, and fabrication knowledge directly into the design framework.
引用
收藏
页码:2767 / 2778
页数:12
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