Effects of three disinfection solutions on residual monomers released from resin nanoceramic CAD/CAM blocks

被引:0
|
作者
Akarsu, Serdar [1 ]
Atasoy, Samet [1 ]
Arikan, Merve [1 ]
Koca, Bengisu [1 ]
Yigin, Sena Nur [1 ]
机构
[1] Ordu Univ, Fac Dent, Dept Restorat Dent, Ordu, Turkiye
关键词
Residual monomer; HPLC; Resin nanoceramic CAD/CAM block; COMPOSITE BLOCKS; ACRYLIC RESINS; POLYMERIZATION; MICROHARDNESS; ELUTION;
D O I
10.1016/j.heliyon.2024.e24369
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The aim of this study was to evaluate the effects of three disinfection solutions on the amount of monomers released from resin nanoceramic CAD/CAM blocks using high performance liquid chromatography (HPLC). Forty resin nanoceramic CAD/CAM (Cerasmart, GC, Japan) samples (12x14 x 2 mm) were divided into four groups; each group was disinfected using one of four solutions (Group 1: no disinfectant; Group 2: 70 % ethanol; Group 3: 2 % glutaraldehyde; and Group 4: 1 % sodium hypochlorite) for 5 min. Analysis of residual monomers (UDMA and BisEMA) amounts was performed using an HPLC instrument (Dionex Ultimate 3000, Thermo Fisher Scientific). After 30 days, the amounts of monomers found were as follows: 14.54 ppm for Group 1; 9.28 ppm for Group 2; 10.60 ppm for Group 3; and 2.76 ppm for Group 4 (the smallest monomer amount) (p < 0.001). Disinfection of indirect restorations prior to cementation can reduce the amount of residual monomers remaining from resin nanoceramic CAD/CAM blocks.
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页数:6
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