Interfaces between MoOx and MoX2(X=S,Se,and Te)

被引:0
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作者
陈凤鸣 [1 ]
刘金鑫 [1 ]
郑晓明 [1 ]
刘龙慧 [1 ]
谢海鹏 [1 ]
宋飞 [2 ]
高永立 [3 ,1 ]
黄寒 [1 ]
机构
[1] Hunan Key Laboratory of Super-microstructure and Ultrafast Process, School of Physics and Electronics, Central South University
[2] Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences
[3] Department of Physics and Astronomy, University of Rochester
基金
中国国家自然科学基金; 美国国家科学基金会; 中央高校基本科研业务费专项资金资助;
关键词
D O I
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中图分类号
TB34 [功能材料];
学科分类号
080501 ;
摘要
In the past decades there have been many breakthroughs in low-dimensional materials,especially in two-dimensional(2D) atomically thin crystals like graphene.As structural analogues of graphene but with a sizeable band gap,monolayers of atomically thin transition metal dichalcogenides(with formula of MX2,M=Mo,W;X=S,Se,Te,etc.) have emerged as the ideal 2D prototypes for exploring fundamentals in physics such as valleytronics due to the quantum confinement effects,and for engineering a wide range of nanoelectronic,optoelectronic,and photocatalytic applications.Transition metal trioxides as promising materials with low evaporation temperature,high work function,and inertness to air have been widely used in the fabrication and modification of MX2.In this review,we reported the fabrications of one-dimensional MoS2wrapped MoO2single crystals with varied crystal direction via atmospheric pressure chemical vapor deposition method and of 2D MoOxcovered MoX2by means of exposing MoX2to ultraviolet ozone.The prototype devices show good performances.The approaches are common to other transition metal dichalcogenides and transition metal oxides.
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页码:127 / 137
页数:11
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