Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation

被引：0
|
作者：
于振坤 [1 ,2 ]
贺洪波 [1 ]
李煦 [1 ,2 ]
齐红基 [1 ]
刘文文 [1 ,2 ]
机构：
[1] Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science
[2] University of Chinese Academy of Sciences
来源：
ChineseOpticsLetters | 2013年 / 11卷 / 07期
基金：
中国国家自然科学基金;
关键词：
Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation;
D O I：
暂无
中图分类号：
TN249 [激光的应用];
学科分类号：
摘要：
An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (LIDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments.
引用
收藏
页码：78 / 79
页数：2
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