Fabrication of Submicron-Diameter and Taper Fibers Using Chemical Etching

The thin, long length and high smoothness silica photonic nanowires and taper optical fiber were fabricated using a simple and low cost chemical etching method. A two-steps wet etch process were used consisting of etching with 30% HF acid to remove cladding and 24% HF acid to decrease fiber core diameter. An approach for on-line monitoring of etching using 1300 nm light power transmitted in the optical fiber was used to determine the diameter of the remaining core and showed a transition between two different operation regimes of nanofiber from the embedded regime, where the mode was isolated from the environment, to the evanescent regime. The data indicated that the diameter of the silica fiber decreased linearly for both 30% and 24% HF acid with 1.2 and 0.1 μm/min grad diameter, respectively at room temperature, and more than 70% of the mode intensity could propagate outside fiber when the core diameter was less than 1 μm. The results of fiber taper showed that the fiber was tapered by a factor of 20 while retaining a thin core structure and leaving about more than 85% of core structure.