Influences of Bias Voltage and Target Current on Structure,Microhardness and Friction Coefficient of Multilayered TiAlN/CrN Coatings Synthesized by Cathodic Arc Plasma Deposition

被引:0
|
作者
阴明利 [1 ,2 ]
田灿鑫 [2 ]
王泽松 [2 ]
付德君 [2 ]
机构
[1] College of Science,Xi'an Technological University
[2] School of Physical Science and Technology and Key Laboratory of Artificial Nano-and Micro-materials of Ministry of Education,Wuhan University
关键词
TiAlN/CrN; cathodic arc plasma; hardness; friction coefficient;
D O I
暂无
中图分类号
TG174.44 [金属复层保护];
学科分类号
080503 ;
摘要
Multilayered TiAlN/CrN coatings have been synthesized on stainless steel substrates by cathodic arc plasma deposition using TiAl and Cr targets.Influences of the bias voltage,cathode current ratio ITiAl/ICr,and deposition pressure on the hardness and friction coefficient of the coatings were investigated.The measurement revealed existence of two cubic phases,face-centercubic (Cr,Al)N and(Ti,Al)N,in the coatings deposited under various bias voltages except for the coating deposited at -400 V,which is amorphous.The hardness of the coatings was strongly dependent on the Itial/Icr ratio and deposition pressure,and reached a maximum of 33 GPa at an ITiAl/ICr ratio of 1.0 and a pressure of 1.0 Pa.The incorporation of the element chromium can reduce the density of pinholes in the coatings and assist the optimization of deposition conditions for high quality TiAlN/CrN coatings.
引用
收藏
页码:582 / 585
页数:4
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