Short-wavelength infrared InAs/GaSb superlattice hole avalanche photodiode

被引:0
|
作者
刘家丰 [1 ,2 ]
张宁涛 [3 ]
滕䶮 [1 ,2 ]
郝修军 [2 ,4 ]
赵宇 [2 ]
陈影 [1 ,2 ]
朱赫 [1 ,2 ]
朱虹 [1 ,2 ]
吴启花 [2 ]
李欣 [2 ]
陈佰乐 [3 ]
黄勇 [1 ,2 ]
机构
[1] School of Nano-Tech and Nano-Bionics, University of Science and Technology of China
[2] Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences
[3] School of Information Science and Technology, Shanghai Tech University
[4] School of Physical Science and Technology, Shanghai Tech University
基金
中国国家自然科学基金;
关键词
D O I
暂无
中图分类号
TN312.7 []; TN304.055 [];
学科分类号
0803 ; 0805 ; 080501 ; 080502 ; 080903 ;
摘要
We demonstrate two short-wavelength infrared avalanche photodiodes based on InAs/GaSb superlattice grown by metal-organic chemical vapor deposition.The difference between the two devices,namely,p;n;n;and p;nn;n;,is that the p;nn;n;device possesses an additional middle-doped layer to separate the multiplication region from the absorption region.By properly controlling the electric field distribution in the p;nn;n;device,an electric field of 906 kV/cm has been achieved,which is 2.6 times higher than that in the p;n;device.At a reverse bias of-0.1 V at 77 K,both devices show a 100% cut-off wavelength of 2.25 μm.The p;n;and p;nn;n;show a dark current density of 1.5×10;A/cm;and 1.8×10;A/cm;,and a peak responsivity about 0.35 A/W and 0.40 A/W at 1.5 μm,respectively.A maximum multiplication gain of 55 is achieved in the p;nn;n;device while the value is only less than 2 in the p;n;n;device.Exponential nature of the gain characteristic as a function of reverse bias confirms a single carrier hole dominated impact ionization.
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页码:537 / 540
页数:4
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