以SiO2为模板制备高比表面积g-C3N4光催化剂

被引：6
|
作者：
余竞雄
崔敏
陈倩倩
何益明
机构：
[1] 浙江师范大学数理与信息工程学院
来源：
浙江师范大学学报(自然科学版) | 2017年 / 40卷 / 01期
基金：
浙江省自然科学基金;
关键词：
石墨相氮化碳; 高比表面积; 光催化; 纳米薄片结构; SiO2嵌入剂;
D O I：
10.16218/j.issn.1001-5051.2017.01.006
中图分类号：
O643.36 [催化剂];
学科分类号：
摘要：
比表面积大小是限制普通块状g-C3N4（Bulk-C3N4）光催化性能的重要因素,以三聚氰胺为原料,SiO2纳米粒子为嵌入剂,采用一种简便的方法制备出一种具有纳米片结构的高比表面积g-C3N4（HA-C3N4）.同时使用X射线粉末衍射（XRD）、傅里叶变化红外光谱（FT-IR）、氮气吸脱附（BET）、透射电镜（TEM）、紫外可见光谱（UV-vis）和荧光光谱（PL）等表征手段分析了所制备材料的结构、形貌特征、比表面积和光学性质.结果表明:所制备的HA-C3N4具备纳米薄片结构,其比表面积相比于Bulk-C3N4由原来的7.1 m2/g提升到了97.3 m2/g.以罗丹明B（Rh B）的降解评价了HA-C3N4的光催化性能,结果表明:当m（SiO2）∶m（三聚氰胺）=3∶7时,HA-C3N-4具有最好的光催化活性,反应速率常数k达到0.055 9 min-1,是Bulk-C3N4的6倍.
引用
收藏
页码：36 / 42
页数：7
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