Key Technologies for Ultra Large-scale Integration

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来源：
Bulletin of the Chinese Academy of Sciences | 2020年 / 34卷 / 01期
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中图分类号：
TN47 [大规模集成电路、超大规模集成电路]; F426.7 [];
学科分类号：
0202 ; 020205 ; 080903 ; 1401 ;
摘要：
After over 30 years of efforts,scientists at the GAS Shanghai Institute of Microsystem and Information Technology （SIMIT） made a technical breakthrough in producing the silicon-on-insulator （SOI） and 12-inch large silicon wafers,and realized its industrialization.In addition,they established China’s first enterprise standard of SOI technology and enabled the products to enter the international high-encd silicon-based materials market.
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页码：37 / 37
页数：1
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