Dry-etched ultrahigh-Q silica microdisk resonators on a silicon chip

被引：0

作者：

JIAXIN GU ^{[1
]}

JIE LIU ^{[1
]}

ZIQI BAI ^{[1
]}

HAN WANG ^{[1
]}

XINYU CHENG ^{[1
]}

GUANYU LI ^{[1
]}

MENGHUA ZHANG ^{[1
]}

XINXIN LI ^{[1
]}

QI SHI ^{[1
]}

MIN XIAO ^{[1
,2
]}

XIAOSHUN JIANG ^{[1
]}

机构：

[1] National Laboratory of Solid State Microstructures, College of Engineering and Applied Science and School of Physics, Nanjing University

[2] Department of Physics, University of Arkansas

来源：

Photonics Research | 2021年 / 05期

基金：

中国国家自然科学基金;

关键词：

D O I：

暂无

中图分类号：

TN751.2 [谐振];

学科分类号：

080904 ;

摘要：

We demonstrate the fabrication of ultrahigh quality(Q) factor silica microdisk resonators on a silicon chip by inductively coupled plasma(ICP) etching. We achieve a dry-etched optical microresonator with an intrinsic Q factor as high as 1.94×10~8 from a 1-mm-diameter silica microdisk with a thickness of 4 μm. Our work provides a chip-based microresonator platform operating in the ultrahigh-Q region that will be useful in nonlinear photonics such as Brillouin lasers and Kerr microcombs.

引用

页码：722 / 725

页数：4

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