Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices

被引:0
|
作者
武唯康 [1 ]
安霞 [1 ]
谭斐 [1 ]
冯慧 [1 ]
陈叶华 [1 ]
刘静静 [1 ]
张兴 [1 ]
黄如 [1 ]
机构
[1] Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University
关键词
heavy ion; displacement damages; PDSOI; performance degradation;
D O I
暂无
中图分类号
TN386 [场效应器件];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
The effects of the physical damages induced by heavy ion irradiation on the performance of partiallydepleted SOI devices are experimentally investigated. After heavy ion exposure, different degradation phenomena are observed due to the random strike of heavy ions. A decrease of the saturation current and transconductance,and an enhanced gate-induced drain leakage current are observed, which are mainly attributed to the displacement damages that may be located in the channel, the depletion region of the drain/body junction or the gate-to-drain overlap region. Further, PDSOI devices with and without body contact are compared, which reveals the differences in the threshold voltage shift, the drain-induced barrier lowing effect, the transconductance and the kink effect. The results may provide a guideline for radiation hardened design.
引用
收藏
页码:45 / 49
页数:5
相关论文
共 50 条
  • [1] Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices
    Wu, Weikang
    An Xia
    Tan Fei
    Feng Hui
    Chen, Yehua
    Liu, Jingjing
    Zhang Xing
    Huang Ru
    [J]. JOURNAL OF SEMICONDUCTORS, 2015, 36 (11)
  • [2] Effects of heavy ion irradiation on ultra-deep-submicron partially-depleted SOI devices
    武唯康
    安霞
    谭斐
    冯慧
    陈叶华
    刘静静
    张兴
    黄如
    [J]. Journal of Semiconductors, 2015, 36 (11) - 49
  • [3] Heavy-Ion-Induced Permanent Damage in Ultra-deep Submicron Fully Depleted SOI Devices
    Tan, Fei
    An, Xia
    Huang, Liangxi
    Zhang, Xing
    Huang, Ru
    [J]. 2012 IEEE 11TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT-2012), 2012, : 999 - 1001
  • [4] Total dose irradiation and annealing effects of domestic partially-depleted SOI PMOSFET
    Cui, Jiang-Wei
    Yu, Xue-Feng
    Liu, Gang
    Li, Mao-Shun
    Gao, Bo
    Lan, Bo
    Zhao, Yun
    Fei, Wu-Xiong
    Chen, Rui
    [J]. Yuanzineng Kexue Jishu/Atomic Energy Science and Technology, 2010, 44 (11): : 1385 - 1389
  • [5] Emerging floating-body effects in advanced partially-depleted SOI devices
    Poiroux, T
    Faynot, O
    Tabone, C
    Tigelaar, H
    Mogul, H
    Bresson, N
    Cristoloveanu, S
    [J]. 2002 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS, 2002, : 99 - 100
  • [6] Floating body effects in partially-depleted SOI CMOS circuits
    Lu, PF
    Ji, J
    Chuang, CT
    Wagner, LF
    Hsieh, CM
    Kuang, JB
    Hsu, L
    Pelella, MM
    Chu, S
    Anderson, CJ
    [J]. 1996 INTERNATIONAL SYMPOSIUM ON LOW POWER ELECTRONICS AND DESIGN - DIGEST OF TECHNICAL PAPERS, 1996, : 139 - 144
  • [7] SOI partially-depleted ultra low voltage memory and digital circuit design
    Thomas, O
    Amara, A
    Valentian, A
    [J]. 2005 International Conference on Integrated Circuit Design and Technology, 2005, : 211 - 215
  • [8] Compact SOI model for fully-depleted and partially-depleted 0.25 um SIMOX devices
    BTA Technology, Inc, Santa Clara, United States
    [J]. IEEE Int Conf Microelectron Test Struct, (222-226):
  • [9] Ultra low power operation of partially-depleted SOI/CMOS integrated circuits
    Mashiko, K
    Ueda, K
    Yoshimura, T
    Hirota, T
    Wada, Y
    Takasoh, J
    Kubo, K
    [J]. IEICE TRANSACTIONS ON ELECTRONICS, 2000, E83C (11) : 1697 - 1704
  • [10] A continuous compact MOSFET model for fully- and partially-depleted SOI devices
    Sleight, JW
    Rios, R
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (04) : 821 - 825