Application of response surface methodology to the chemical cleaning process of ultrafiltration membrane

被引:1
|
作者
Caihong Wang [1 ,2 ]
Aishu Wei [3 ]
Hao Wu [4 ]
Fangshu Qu [1 ]
Weixiong Chen [2 ]
Heng Liang [1 ]
Guibai Li [1 ]
机构
[1] State Key Laboratory of Urban Water Resource and Environment (SKLUWRE),Harbin Institute of Technology
[2] The Architecture Design and Research Institute of Guangdong Province
[3] China Urban Construction Design & Research Institute
[4] School of Environment and Energy,South China University of Technology
关键词
Ultrafiltration; Response surface methodology; Chemical cleaning; Water treatment;
D O I
暂无
中图分类号
TQ051.893 [];
学科分类号
080706 ;
摘要
A numerical model was established to predict and optimise the chemical cleaning process of Polyvinylidene Fluoride(PVDF)Ultra filtration(UF)membranes with the results from the experiment that applied the Response Surface Method(RSM)and Central Composite Design(CCD).The factors considered in the experimental design were sodium hydroxide(NaOH)concentration,sodium hypochlorite concentration(NaClO),citric acid concentration and cleaning duration.The interactions between the factors were investigated with the numerical model.Humic acid(20 mg·L-1)was used as the model foulant,and chemical enhanced back flush(CEB)was employed to simulate the chemical cleaning process.The concentrations of sodium hydroxide,sodium hypochlorite,citric acid and cleaning duration tested during the experiments were in the range of 0.1%–0.3%,100–300 mg·L-1,1%–3%and 0.5–1.5 h,respectively.Among the variables,the sodium hypochlorite concentration and the cleaning duration showed a positive relationship involving the increased ef ficiency of the chemical cleaning.The chemical cleaning ef ficiency was hardly improved with increasing concentrations of sodium hydroxide.However,the data was sharply decreased when at a low level of sodium hydroxide concentration.In total,54 sets of cleaning schemes with 80%to 100%cleaning ef ficiency were observed with the RSM model after calibration.
引用
收藏
页码:651 / 657
页数:7
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