A Model for Extreme Ultraviolet Radiation Conversion Efficiency From Laser Produced Mass-Limited Tin-Based Droplet Target Plasmas

被引：0
|
作者：
吴涛 [1 ,2 ]
王新兵 [1 ]
余仕成 [2 ]
熊伦 [2 ]
机构：
[1] Wuhan National Laboratory for Optoelectronics,School of Optoelectronic Science and Engineering,Huazhong University of Science and Technology
[2] School of Science,Wuhan Institute of Technology
来源：
Communications in Theoretical Physics | 2012年 / 57卷 / 04期
基金：
中国国家自然科学基金;
关键词：
conversion efficiency; laser produced plasma; extreme ultraviolet lithography;
D O I：
暂无
中图分类号：
O53 [等离子体物理学];
学科分类号：
070204 ;
摘要：
Simple arguments are used to construct a model to explain the extreme ultraviolet radiation conversion efficiency(EUV-CE) of a tin-based droplet target laser produced plasmas by calculating the laser absorption efficiency,radiation efficiency,and spectral efficiency.The dependence of drive laser pulse duration and laser intensity on EUV-CE is investigated.The results show that at some appropriate laser intensity,where the sum energy of the thermal conduction,out-off band radiation and plasma plume kinetic losses is at a minimum,the EUV-CE should reach a maximum.The EUV-CE predicted by the present simple model is also compared with the available experimental and simulation data and a fair agreement between them is found.
引用
收藏
页码：695 / 700
页数：6
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