Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition
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作者:
高飞
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School of Physics and Optoelectronic Technology, Dalian University of TechnologySchool of Physics and Optoelectronic Technology, Dalian University of Technology
高飞
[1
]
李雪春
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School of Physics and Optoelectronic Technology, Dalian University of TechnologySchool of Physics and Optoelectronic Technology, Dalian University of Technology
李雪春
[1
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赵书霞
[2
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王友年
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School of Physics and Optoelectronic Technology, Dalian University of TechnologySchool of Physics and Optoelectronic Technology, Dalian University of Technology
王友年
[1
]
机构:
[1] School of Physics and Optoelectronic Technology, Dalian University of Technology
[2] Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1,B-2610 Antwerp, Belgium
A Langmuir probe and an ICCD are employed to study the discharge mode transition in Ar inductively coupled plasma. Electron density and plasma emission intensity are measured during the E (capacitive discharge) to H (inductive discharge) mode transitions at different pressures. It is found that plasma exists with a low electron density and a weak emission intensity in the E mode, while it has a high electron density and a strong emission intensity in the H mode. Meanwhile, the plasma emission intensity spatial (2D image) profile is symmetrical in the H mode, but the 2D image is an asymmetric profile in the E mode. Moreover, the electron density and emission intensity jump up discontinuously at high pressure, but increase almost continuously at the E to H mode transition under low pressure.