Room Temperature Annealing of Gamma Radiation Damage in Zener Diodes

被引:0
|
作者
Rahman, Md Hafijur [1 ]
Chavda, Chintan [1 ]
Warner, Luke [1 ]
Stafford, Shawn [2 ]
Carvajal, Jorge [2 ]
Haque, Aman [1 ]
Ren, Fan [3 ]
Pearton, Stephen [4 ]
Wolfe, Douglas E. [5 ]
机构
[1] Penn State Univ, Dept Mech Engn, University Pk, PA 16803 USA
[2] Westinghouse Elect Co, Pittsburgh, PA 15235 USA
[3] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[4] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[5] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
关键词
Co-60 gamma radiation; zener diode; electron wind force; raman spectroscopy; room-temperature annealing; DISPLACEMENT DAMAGE; SILICON; DEVICES;
D O I
10.1149/2162-8777/adb685
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Gamma radiation is detrimental to semiconductor-based sensors or instrumentation. The ensuing damage can be very difficult to repair with conventional annealing approaches, particularly in as-deployed conditions. This study proposes application of the non-thermal electron wind force (EWF) to restore device performance and thus improve resilience to radiation exposure. The technique is demonstrated on Zener diodes exposed to Co-60 gamma radiation doses up to 2.65 Mrad (Si), which resulted in significant degradation of forward and reverse bias currents due to the formation of radiation-induced defects. EWF annealing, conducted at near-ambient temperatures for just one minute, not only completely restored the forward current affected by 2.65 Mrad (Si) of gamma radiation but also enhanced it beyond the pristine condition. In terms of reverse bias, the treatment achieved a recovery of 74.5%. Raman spectroscopy revealed increased full width at half maximum values of the characteristic peak of phonon mode of crystalline Si following the EWF annealing, indicating healing of lattice disorder and defects. Thermal annealing at 100 degrees C for 90 min showed no recovery or even more degradation, probably due to additional thermal stress. Because EWF annealing requires only electrical connections, it can be implemented "in-operando," extending lifetime of semiconductor devices in radiation environments.
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页数:7
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