Inelastic Scattering in Weak Localization for Single-Layer Graphene

被引:0
|
作者
Fujimoto, Akira [1 ]
Terasawa, Daiju [2 ]
Fukuda, Akira [2 ]
Jiang, Zhigang [3 ]
Vogel, Eric M. [4 ]
机构
[1] Osaka Inst Technol, Appl Phys, Osaka 5358585, Japan
[2] Hyogo Med Univ, Sch Med, Dept Phys, Nishinomiya 6638501, Japan
[3] Georgia Tech, Sch Phys, Atlanta, GA 30332 USA
[4] Georgia Tech, Sch Mat Sci & Engn, Atlanta, GA 30332 USA
基金
日本学术振兴会;
关键词
electron-electron interaction; inelastic scattering; Nyquist scattering; single-layer graphene; Ti-cleaning; weak localization; MAGNETOTRANSPORT;
D O I
10.1002/pssb.202400536
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Chemical-vapor-deposited graphene is used extensively to fabricate devices. However, the charge-neutral point (CNP) of this material appears at a relatively high back-gate voltage (VG) because of molecular adsorption and impurities on the graphene surface. In this study, a Ti-cleaning process is used to remove contaminants from the transferred graphene. Two contributions to the magnetoresistance are investigated: weak localization (WL) and inhomogeneous charge transport near the Dirac point. One of the most important parameters for clarifying the quantum transport properties is the inelastic scattering time. Fitting of the experimental results with a theoretical WL expression is performed to investigate the temperature and VG dependence of the inelastic scattering and intervalley scattering rates. Small momentum transfer due to Nyquist scattering is dominant in the CNP region, while large momentum transfer processes of direct electron-electron interaction dominate the electron and hole-transport regions.
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页数:6
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