Interface effect based nano-scale TiOX vertical synapse device for high-density integration in neuromorphic computing system

被引:0
|
作者
Cho, Seojin [1 ]
Han, Geonhui [2 ]
Lee, Chuljun [3 ,4 ]
Woo, Jiyong [5 ]
Lee, Daeseok [1 ]
机构
[1] Kwangwoon Univ, Dept Semicond Engn, Seoul 01897, South Korea
[2] Kwangwoon Univ, Dept Elect Mat Engn, Seoul 01897, South Korea
[3] Pohang Univ Sci & Technol, Ctr Single Atom Based Semicond Device, Pohang 37673, South Korea
[4] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 37673, South Korea
[5] Kyungpook Natl Univ, Sch Elect & Elect Engn, Daegu 41566, South Korea
基金
新加坡国家研究基金会;
关键词
synapse device; neuromorphic system; vertical structure; gradual conductance change; interface type resistive switching; RESISTIVE SWITCHING MEMORY; MECHANISM;
D O I
10.1088/1361-6528/adad78
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
To implement a neuromorphic computing system capable of efficiently processing vast amounts of unstructured data, a significant number of synapse and neuron devices are needed, resulting in increased area demands. Therefore, we developed a nanoscale vertically structured synapse device that supports high-density integration. To realize this synapse device, the interface effects between the resistive switching layer and the electrode were investigated and utilized. Electrical and physical analyses were conducted to comprehend the operational mechanism of the developed synapse device. The results indicate that oxygen ions from the resistive switching layer were absorbed by the electrode, forming metal-oxygen bonds. The VO concentration in the switching layer that can change the total conductance of the device. To assess its potential as a synapse device in the neuromorphic system, the developed device was evaluated through pattern recognition simulation.
引用
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页数:10
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