Optimization of P-N junction diode using crack-free PbS thin films: The role of Y3+doping via jet nebulizer spray pyrolysis

被引:2
|
作者
Vidhya, P. [1 ]
Shanmugasundaram, K. [1 ]
Sasikala, T. [2 ]
Akila, T. [3 ]
Balasubramani, V. [3 ]
Rajamanikam, A. T. [1 ]
Siddiqui, Nasir A. [4 ]
Khan, Aslam [5 ]
机构
[1] Sri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Elect, Coimbatore 641 020, Tamil Nadu, India
[2] Hindustan Coll Arts & Sci, Dept Phys, Coimbatore 641028, Tamil Nadu, India
[3] Saveetha Inst Med & Tech Sci, Saveetha Sch Engn, Dept Phys, Chennai 602105, Tamil Nadu, India
[4] King Saud Univ, Coll Pharm, Dept Pharmacognosy, Riyadh 11451, Saudi Arabia
[5] King Saud Univ, King Abdullah Inst Nanotechnol, Riyadh 11451, Saudi Arabia
关键词
Thin films; Junction diode; Jet nebulizer spray pyrolysis; I -V characteristics; Photodiode applications; Optoelectronic applications; ELECTRICAL-PROPERTIES; OPTICAL-PROPERTIES; IMPACT;
D O I
10.1016/j.physb.2024.416836
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This study uses jet nebulizer spray pyrolysis for photodiode applications to prepare PbS films with varying Yttrium (Y) doping concentrations (0, 1, 3, and 5 wt%). XRD results reveal that Y-doped PbS films have a cubic structure, with grain size increasing as Y concentration rises, signifying successful Y incorporation into the PbS lattices. FESEM analysis shows the thin films have a triangular, nanostructured, crack-free surface. XPS confirms the presence of PbS, and Y. At the same time, optical studies indicate improved performance with Y doping, with the 3 % Y-doped film demonstrating outstanding photosensitivity (2895.21 %) and response of 208.33 mA/W, highlighting its potential for optoelectronic applications.
引用
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页数:10
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