In-Device Ballistic-Electron-Emission Spectroscopy for Accurately In Situ Mapping Energy Level Alignment at Metal-Organic Semiconductors Interface

被引:0
|
作者
Meng, Ke [1 ,2 ]
Zheng, Ruiheng [1 ,2 ]
Gu, Xianrong [1 ]
Zhang, Rui [3 ]
Guo, Lidan [1 ,2 ]
Qin, Yang [1 ]
Yang, Tingting [1 ]
Li, Min [1 ,3 ]
Hu, Shunhua [1 ,2 ]
Zhang, Cheng [1 ,4 ]
Wu, Meng [1 ,2 ]
Guo, Ankang [1 ,2 ]
Yang, Xueli [1 ,2 ]
Zhang, Jianqi [1 ]
Sun, Xiangnan [1 ,2 ]
机构
[1] Natl Ctr Nanosci & Technol, Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China
[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
[3] Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Solids, Beijing 100124, Peoples R China
[4] China Univ Petr, Dept Mat Sci & Engn, Coll New Energy & Mat, Beijing 102249, Peoples R China
基金
中国国家自然科学基金; 北京市自然科学基金;
关键词
energy barrier; energy level alignment; in-device ballistic-electron-emission spectroscopy; metal/organic semiconductor interface; organic electronics; HIGH-MOBILITY; BAND-STRUCTURE; LARGE-AREA; TRANSPORT; ORIENTATION; POLYMER; IMPACT;
D O I
10.1002/adma.202412758
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Energy level alignment at metal/organic semiconductors (OSCs) interface governs electronic processes in organic electronics devices, making its precise determination essential for understanding carrier transport behaviors and optimizing device performance. However, it is proven that accurately characterizing the energy barrier at metal/OSC interface under operational conditions remains challenging due to the technical limitations of traditional methods. Herein, through integrating highly-improved device constructions with an ingenious derivative-assisted data processing method, this study demonstrates an in-device ballistic-electron-emission spectroscopy using hot-electron transistors to accurately characterize the energy barrier at metal/OSC interface under in-operando conditions. This technique is found that a remarkable improvement in measurement accuracy, reaching up to +/- 0.03 eV, can be achieved-surpassing previous techniques (+/- 0.1-0.2 eV). The high accuracy allows us to monitor subtle changes in energy barriers at metal/OSC interface caused by variations in the aggregation state of OSCs, a phenomenon that is theoretically possible but failed to be directly demonstrated through conventional methods. Moreover, this study makes demonstration that this technology is universally applicable to various metal/OSC interfaces consisting of electron-transporting, hole-transporting, and ambipolar OSCs. These findings manifest the great potential of this method to advance both theoretical exploration and technical applications in organic electronics.
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页数:8
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