Synthesis and electron-transporting properties of phenazine bisimides

被引:0
|
作者
Tajima, Keita [1 ,2 ]
Moribe, Taito [1 ,2 ]
Matsuo, Kyohei [3 ]
Yamada, Hiroko [3 ]
Seki, Shu [4 ]
Yokokura, Seiya [5 ]
Shimada, Toshihiro [5 ]
Fukui, Norihito [1 ,2 ,6 ]
Shinokubo, Hiroshi [1 ,2 ]
机构
[1] Nagoya Univ, Grad Sch Engn, Dept Mol & Macromol Chem, Furo Cho,Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Integrated Res Consortium Chem Sci IRCCS, Furo Cho,Chikusa Ku, Nagoya, Aichi 4648603, Japan
[3] Kyoto Univ, Inst Chem Res, Uji, Kyoto 6110011, Japan
[4] Kyoto Univ, Grad Sch Engn, Dept Mol Engn, Nishikyo Ku, Kyoto 6158510, Japan
[5] Hokkaido Univ, Grad Sch Chem Sci & Engn, Kita 13 Nishi 8,Kita Ku, Sapporo, Hokkaido 0608628, Japan
[6] Japan Sci & Technol Agcy JST, PRESTO, Kawaguchi, Saitama 3320012, Japan
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The dual incorporation of imide substituents and imine-type nitrogen atoms into pi-systems represents an emerging guideline for the design of robust and high-performance n-type semiconductors. Herein, we have adapted this strategy to a simple molecular motif: anthracene, and thus synthesized phenazine bisimides (PzBIs). PzBIs exhibit superior electron affinity compared to anthracene bisimide and phenazine due to the presence of two types of functional electron-withdrawing units. The existence of imine-type nitrogen atoms in PzBI leads to the formation of two-dimensionally extended brickwork arrangements while anthracene bisimide forms one-dimensionally slipped-stacked arrays. Consequently, the electron mobility of the vacuum-deposited film of N,N '-dicyclohexyl PzBI is ten times higher than that of the corresponding anthracene bisimide. Furthermore, the OFET device of N,N '-bisheptafluorobutyl PzBI exhibits good air persistency, and its intrinsic electron mobility has been estimated to be approximately 0.7 cm(2) V-1 s(-1) by the time-resolved microwave conductivity measurement. The current study demonstrates that the dual incorporation strategy endows even a simple and small pi-system with good performance as an n-type semiconductor.
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页码:655 / 662
页数:8
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