共 16 条
- [1] Spatial distribution measurement of absolute densities of CF and CF2 radicals in a high density plasma reactor using a combination of single-path infrared diode laser absorption spectroscopy and laser-induced fluorescence technique JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1999, 38 (12A): : L1469 - L1471
- [2] Measurement of spatial distribution of SiF4 and SiF2 densities in high density SiF4 plasma using single-path infrared diode laser absorption spectroscopy and laser-induced fluorescence technique JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (07): : 4730 - 4735
- [9] CF3, CF2 AND CF RADICAL MEASUREMENTS IN RF CHF3 ETCHING PLASMA USING INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B): : 4298 - 4302
- [10] Surface reactivity of CF2 radicals measured using laser-induced fluorescence and C2F6 plasma molecular beams JOURNAL OF PHYSICAL CHEMISTRY B, 1997, 101 (46): : 9425 - 9428