Modeling the self-sustained discharge-excited XeCl laser in two dimensions

被引:0
|
作者
机构
来源
| 1600年 / 71期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] MODELING THE SELF-SUSTAINED DISCHARGE-EXCITED XECL LASER IN 2 DIMENSIONS
    TURNER, MM
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (05) : 2113 - 2122
  • [2] MODELING OF THE SELF-SUSTAINED, DISCHARGE-EXCITED XENON CHLORIDE LASER
    TURNER, MM
    SMITH, PW
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) : 350 - 360
  • [3] MODELING OF A SELF-SUSTAINED DISCHARGE-EXCITED ARF EXCIMER-LASER
    AKASHI, H
    SAKAI, Y
    TAGASHIRA, H
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (06) : 1097 - 1106
  • [4] STABILITY OF TRANSVERSE SELF-SUSTAINED DISCHARGE-EXCITED LONG-PULSE XECL LASERS
    COUTTS, J
    WEBB, CE
    JOURNAL OF APPLIED PHYSICS, 1986, 59 (03) : 704 - 710
  • [5] STABILITY OF TRANSVERSE SELF-SUSTAINED DISCHARGE-EXCITED LONG-PULSE XeCl LASERS.
    Coutts, J.
    Webb, C.E.
    1600, (59):
  • [6] SCALING UP OF A CLOSED-CYCLE SELF-SUSTAINED DISCHARGE-EXCITED CO LASER
    SAITO, H
    KANAZAWA, H
    WATANABE, K
    TAIRA, T
    SATO, S
    FUJIOKA, T
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (08): : 1417 - 1421
  • [7] AN EFFICIENT AND COMPACT DISCHARGE-EXCITED XECL LASER
    CHRISTOV, CG
    CHALTAKOV, IV
    TOMOV, IV
    LYUTSKANOV, VL
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1984, 17 (02) : 247 - 252
  • [8] MODELING OF A SELF-SUSTAINED DISCHARGE-EXCITED ARF EXCIMER-LASER - THE INFLUENCE OF PHOTOIONIZATION AND PHOTODETACHMENT BY LASER-LIGHT ON THE DISCHARGE DEVELOPMENT
    AKASHI, H
    SAKAI, Y
    TAGASHIRA, H
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (03) : 445 - 451
  • [9] Kinetic modeling of self-sustained discharge XeCl laser and its influence on the efficiency
    Belasri, A
    Harrache, Z
    HIGH TEMPERATURE MATERIAL PROCESSES, 2003, 7 (02): : 127 - 137
  • [10] IMPROVED PERFORMANCE OF A CLOSED-CYCLE SELF-SUSTAINED DISCHARGE-EXCITED CW CO LASER
    SATO, SI
    KIYOTA, M
    FUJIOKA, T
    SAITO, H
    JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) : 3991 - 3995