Anomalous etching residues of sputter-deposited Ta upon reactive ion etching using chlorine-based plasmas

被引：0

作者：

Nakaishi, Masafumi ^{[1
]}

Yamada, Masao ^{[1
]}

Kondo, Kazuaki ^{[1
]}

Yamabe, Masaki ^{[1
]}

Sugishima, Kenji ^{[1
]}

机构：

[1] Fujitsu Ltd, Kawasaki, Japan

来源：

Japanese Journal of Applied Physics, Part 2: Letters | 1992年 / 31卷 / 11 B期

关键词：

Tantalum;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

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