Anomalous etching residues of sputter-deposited Ta upon reactive ion etching using chlorine-based plasmas

被引：0
|
作者：
Nakaishi, Masafumi [1 ]
Yamada, Masao [1 ]
Kondo, Kazuaki [1 ]
Yamabe, Masaki [1 ]
Sugishima, Kenji [1 ]
机构：
[1] Fujitsu Ltd, Kawasaki, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1992年 / 31卷 / 11 B期
关键词：
Tantalum;
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