Oxygen plasma reactive ion etching of tetrahedral amorphous carbon

被引：0
|
作者：
Park, J.S. [1 ]
Milne, W.I. [1 ]
机构：
[1] Hanyang Univ, Kyunggi-Do, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1996年 / 35卷 / 12 A期
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摘要：
Carbon
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