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- [2] CF3, CF2 AND CF RADICAL MEASUREMENTS IN RF CHF3 ETCHING PLASMA USING INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B): : 4298 - 4302MARUYAMA, KOHKOUCHI, KOHTSU, YGOTO, T
- [3] CF and CF2 radical densities in 13.56-Mhz CHF3/Ar inductively coupled plasma [J]. Nakagawa, H. (nakagawa@krl.mee.met.co.jp), 1600, Japan Society of Applied Physics (41):
- [4] CF and CF2 radical densities in 13.56-MHz CHF3/Ar inductively coupled plasma[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (01): : 319 - 325Nakagawa, HOkigawa, MMorishita, SNoda, SHayashi, HIto, KInoue, MSekine, M
- [5] Generation and observation of CHF2, CF2, and CF3 in a CF4/He microwave discharge system:: A mass spectrometric method[J]. CHEMICAL PHYSICS LETTERS, 2005, 409 (4-6) : 342 - 348Sablier, MIwase, KSato, GFujii, T
- [6] Synthesis and crystallographic characterization of dimeric perfluoroalkyl iridium complexes: [Cp*Ir(X)(RF)]2 (X = I, RF = CF3, CF2CF3, CF2CF2CF3, CF(CF3)2, CF(CF3)(CF2CF3); X = Cl and Br, RF = CF2CF3), and a new perfluoroethylidene complex Cp*Ir(PPh3)(CFCF3)[J]. INORGANICA CHIMICA ACTA, 2010, 364 (01) : 96 - 101Yuan, JianHughes, Russell P.Rheingold, Arnold L.
- [7] UV EMISSION OF CF2 PRODUCED BY ELECTRON AND ION IMPACT OF CHF3[J]. CHEMICAL PHYSICS, 1985, 95 (03) : 443 - 448AARTS, JFM
- [8] Preparation and properties of CF3As[ON(H)CF3](2) and (CF3)(2)AsON(H)CF3[J]. JOURNAL OF FLUORINE CHEMISTRY, 1996, 76 (01) : 111 - 115Ang, HGKoh, CH
- [9] Evaluating aliphatic CF, CF2, and CF3 groups as vibrational Stark effect reporters[J]. JOURNAL OF CHEMICAL PHYSICS, 2024, 160 (20):Cruz, R.Ataka, K.Heberle, J.Kozuch, J.
- [10] THE FORMATION OF EMITTING CF3 AND CF2 RADICAL STATES BY PULSED ELECTRON-BEAM EXCITATION[J]. RADIATION PHYSICS AND CHEMISTRY, 1990, 36 (02): : 227 - 231HERMANN, R
