Fabrication of phase masks, for fiber grating printing, using EBL and CHF3 RIE

被引：0
|
作者：
Ardito, M. [1 ]
Boschis, L. [1 ]
Palumbo, R. [1 ]
Meneghini, G. [1 ]
机构：
[1] CSELT S.p.A, Ctro. Studi E Laboratori T., Via G. Reiss Romoli 274, 10148- Turin, Italy
来源：
Microelectronic Engineering | 1999年 / 46卷 / 01期
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摘要：
10
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页码：251 / 254
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