Computer aided proximity effect correction system in photolithography

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[1] Hirai, Yoshihiko
[2] Nomura, Noboru
[3] Misaka, Akio
[4] Hayama, Shigeru
[5] Yamashita, Kazuhiro
[6] Harafuji, Kenji
来源：
Hirai, Yoshihiko | 1600年 / 28期
关键词：
Lithography;
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