Magnetic anisotropy of epitaxial Cu/Ni/Cu nanolines

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作者：
机构：
[1] Lyons, E.S.
[2] O'Handley, R.C.
[3] Ross, C.A.
来源：
Lyons, E.S. (zillyons@mit.edu) | 1600年 / American Institute of Physics Inc.卷 / 95期
关键词：
Antireflection coatings - Demagnetization - Electron beams - Evaporation - Lithography - Magnetic anisotropy - Magnetic films - Magnetization - Magnetostatics - Mathematical models - Molecular beam epitaxy - Nickel - Random access storage - Reflection high energy electron diffraction - Relaxation processes - Strain;
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摘要：
The changes to the magnetic anisotropy upon patterning on epitaxial nickel (Ni) film, 7 nm thick, into 200 nm wide nanolines were investigated. The Ni films were found to exhibit strong perpendicular magnetic anisotropy due to magnetoelastic and interface magnetocrystalline anisotropy energies. The ion milling and interferometric lithography methods were used for the patterning of Cu/Ni/Cu films. It was observed that the magnetoelastic anisotropy was decreased in patterned films due to strain relaxation at the line edges. The measurements from torque magnetometer showed that the anisotropy of the nanolines was found to be different from the anisotropy of the the continuous films.
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