Chemical vapor deposition of copper-cobalt binary films

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作者：
Gu, Shuo [1 ]
Atanasova, Paolina [1 ]
Hampden-Smith, Mark J. [2 ]
Kodas, Toivo T. [1 ]
机构：
[1] Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131, United States
[2] Department of Chemistry, University of New Mexico, Albuquerque, NM 87131, United States
来源：
Thin Solid Films | / 340卷 / 01期
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页码：45 / 52
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