FUTURE TRENDS IN ELECTRON BEAM TESTING.

被引:0
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作者
Wolfgang, Eckhard [1 ]
机构
[1] Forschungslaboratorien der Siemens, AG, Munich, West Ger, Forschungslaboratorien der Siemens AG, Munich, West Ger
关键词
AUTOMATIC TESTING - COMPUTER AIDED DESIGN - COMPUTER INTERFACES - MICROSCOPIC EXAMINATION - Scanning Electron Microscopy;
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摘要
Current trends in electron beam testing (EBT) are determined by those prevailing in microelectronics. This paper describes those aspects of microelectronics which have a particularly significant effect on EBT. Future trends in EBT are discussed against this background and on the basis of a description of state-of-the-art EBT systems. In its currently available, basic form, EBT can deal with the next two circuit generations, although interesting scopes still exist for improving the time resolution. A critical view must be taken of integration with computer-aided design (CAD) and computer-aided testing (CAT) where standardized interfaces are lacking.
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页码:435 / 444
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