Structural analysis of thermally oxidized amorphous Si1-xGex layers

被引：0
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作者：
Benrakkad, M.S. [1 ]
Ferrer, J.C. [1 ]
Garrido, B. [1 ]
Pedroviejo, J.J. [1 ]
Calderer, J. [1 ]
Morante, J.R. [1 ]
机构：
[1] Universitat de Barcelona, Barcelona, Spain
来源：
| 1600年 / Elsevier Science B.V., Amsterdam, Netherlands卷 / 28期
关键词：
531.2; Metallography; -; 549.3; Others; including Bismuth; Boron; Cadmium; Cobalt; Mercury; Niobium; Selenium; Silicon; Tellurium and Zirconium - 741.1 Light/Optics - 741.3 Optical Devices and Systems - 801 Chemistry - 802.2 Chemical Reactions;
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摘要：
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页码：1 / 4
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