'Oxygen pump' model for diffusion in thin films

被引：0
|
作者：
Voloshko, S.M. [1 ]
Sidorenko, S.I. [1 ]
Cherkashchcnko, Yu.V. [1 ]
Lutsenko, G.V. [1 ]
机构：
[1] Natl. Tech. Univ. of the Ukraine, Kyyiv Politechnical Institute, 37 Pobedy prospekt, UA-03056 Kyyiv-56, Ukraine
来源：
Metal Physics and Advanced Technologies | 2001年 / 19卷 / 09期
关键词：
Surface layers;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1229 / 1233
相关论文
共 50 条
  • [1] A model of the 'oxygen pump' during the diffusion in thin films
    Voloshko, SM
    Sidorenko, SI
    Cherkashchenko, YV
    Lutsenko, GV
    METALLOFIZIKA I NOVEISHIE TEKHNOLOGII, 1999, 21 (09): : 67 - 70
  • [2] OXYGEN DIFFUSION-COEFFICIENT IN THIN VANADIUM FILMS
    GURYANOV, AA
    TERUKOV, EI
    ZHURNAL TEKHNICHESKOI FIZIKI, 1981, 51 (04): : 858 - 860
  • [3] THE MODELING OF OXIDE GROWTH PROCESS ON THE SURFACE DURING THE DIFFUSION IN THIN FILMS UNDER CONDITIONS OF "OXYGEN PUMP" ACTION
    Oleshkevych, A. I.
    Gusak, A. M.
    Sidorenko, S. I.
    Voloshko, S. M.
    UKRAINIAN JOURNAL OF PHYSICS, 2010, 55 (09): : 1004 - 1012
  • [4] Luminescence measurements of oxygen permeation and oxygen diffusion in thin polymer films
    Yekta, Ahmad
    Masoumi, Zahra
    Winnik, Mitchell A.
    Canadian Journal of Chemistry, 1995, 73 (11): : 2021 - 2029
  • [5] Luminescence measurements of oxygen permeation and oxygen diffusion in thin polymer films
    Yekta, A
    Masoumi, Z
    Winnik, MA
    CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1995, 73 (11): : 2021 - 2029
  • [6] DIFFUSION OF OXYGEN MOLECULES IN AMORPHOUS SILICA THIN-FILMS
    SUSA, M
    SHINOHARA, H
    NAGATA, K
    GOTO, KS
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1990, 54 (02) : 193 - 200
  • [7] Oxygen diffusion through thin Pt films on Si(100)
    Schmiedl, R
    Demuth, V
    Lahnor, P
    Godehardt, H
    Bodschwinna, Y
    Harder, C
    Hammer, L
    Strunk, HP
    Schulz, M
    Heinz, K
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1996, 62 (03): : 223 - 230
  • [8] Preparation of oxide thin films by controlled diffusion of oxygen atoms
    Rosenstock, Z
    Riess, I
    SOLID STATE IONICS, 2000, 136 : 921 - 926
  • [9] Influence of oxygen diffusion on residual stress for tantalum thin films
    Cheng, M. H.
    Cheng, T. C.
    Huang, W. J.
    Chang, M. N.
    Chung, M. K.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (01): : 147 - 151
  • [10] OXYGEN VACANCY DIFFUSION IN SNO2 THIN-FILMS
    ADVANI, GN
    KLUGEWEISS, P
    LONGINI, RL
    JORDAN, AG
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1980, 48 (05) : 403 - 411
12345