Measurements of nanometer scale interface diffusion between tungsten and niobium thin films using high frequency laser based ultrasound

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作者：
Richardson, C.J.K.
Ehrlich, M.J.
Wagner, J.W.
机构：
[1] Dept. of Mat. Sci. and Engineering, Johns Hopkins University, Baltimore, MD 21218, United States
[2] Dept. of Mat. Sci. and Engineering, Case Western Reserve University, Cleveland, OH 44106-7220, United States
来源：
| 1987年 / American Institute of Physics Inc.卷 / 107期
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