CW LASER ANNEALING OF POLYCRYSTALLINE SILICON ON SIO2 ANDEFFECTS OF SUCCESSIVE FURNACE ANNEALING.

被引:0
|
作者
KUGIMIYA, KOICHI
FUSE, GENSHU
INOUE, KAORU
机构
来源
| 1982年 / V 21卷 / N 1期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
7
引用
收藏
页码:19 / 21
相关论文
共 50 条
  • [1] CW LASER ANNEALING OF POLYCRYSTALLINE SILICON ON SIO2 AND EFFECTS OF SUCCESSIVE FURNACE ANNEALING
    KUGIMIYA, K
    FUSE, G
    INOUE, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1982, 21 (01): : L19 - L21
  • [2] Polycrystalline Silicon Films on SiO2 Substrate Treated by Excimer Laser Annealing
    Duan, C. Y.
    Ai, Bin
    Li, R. X.
    Liu, Chao
    Lai, J. J.
    Deng, Y. J.
    Shen, Hui
    ADVANCED ENGINEERING MATERIALS III, PTS 1-3, 2013, 750-752 : 946 - +
  • [3] CW LASER ANNEALING OF BORON IMPLANTED POLYCRYSTALLINE SILICON
    PETERSTROM, S
    HOLMEN, G
    ALESTIG, G
    SOLID-STATE ELECTRONICS, 1985, 28 (04) : 339 - 344
  • [4] EFFECT OF LASER POWER LEVEL IN CW LASER ANNEALING OF POLYCRYSTALLINE SILICON
    GERZBERG, L
    LEE, KF
    GIBBONS, JF
    GAT, A
    PENG, J
    MAGEE, TJ
    DELINE, VR
    EVANS, CA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C384 - C384
  • [5] GRAIN-GROWTH OF POLYCRYSTALLINE SILICON FILMS ON SIO2 BY CW SCANNING ELECTRON-BEAM ANNEALING
    SHIBATA, K
    INOUE, T
    TAKIGAWA, T
    YOSHII, S
    APPLIED PHYSICS LETTERS, 1981, 39 (08) : 645 - 647
  • [6] ACTIVATION OF POLYSILICON CONNECTIONS BY SELECTIVE CW LASER ANNEALING.
    Calder, I.D.
    Naguib, H.M.
    Electron device letters, 1985, EDL-6 (10): : 557 - 559
  • [7] LASER ANNEALING OF POLYCRYSTALLINE SILICON
    WU, CP
    JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 701 - 701
  • [8] CW LASER ANNEALING OF ION-IMPLANTED OR DOPED POLYCRYSTALLINE SILICON
    AKASAKA, Y
    NISHIMURA, T
    SOLID STATE TECHNOLOGY, 1981, 24 (06) : 88 - 94
  • [9] CW CO2-LASER ANNEALING OF BORON-DOPED POLYCRYSTALLINE SILICON
    AROLE, VM
    TAKWALE, MG
    OGALE, SB
    BHIDE, VG
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (12) : 1761 - 1763
  • [10] MICROSTRUCTURE OF POLYCRYSTALLINE SILICON FILMS OBTAINED BY COMBINED FURNACE AND LASER ANNEALING
    CARLUCCIO, R
    STOEMENOS, J
    FORTUNATO, G
    MEAKIN, DB
    BIANCONI, M
    APPLIED PHYSICS LETTERS, 1995, 66 (11) : 1394 - 1396