Many-beam Effects on Thickness Fringes in a Silicon Wedge Crystal

被引:0
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作者
Izui, Kazuhiko [1 ]
Nishida, Takahiko [1 ]
Furuno, Shigemi [1 ]
机构
[1] Japan Atomic Energy Research Institute, Ibaraki-ken, Japan
关键词
Diffraction conditions - MeV-Electrons;
D O I
10.1093/oxfordjournals.jmicro.a049890
中图分类号
学科分类号
摘要
Thickness fringes in a silicon wedge crystal are observed with a 1 MeV electron microscope under some different diffraction conditions. Many-beam calculations of the extinction distances are also performed to compare with the observed results. Accidental interactions cause a remarkable decrease in the extinction distances, while systematic interactions give a little effect on these. As for the (220) extinction distances, a systematic eight-beam computation gives only ~ 2 % decrease In comparison with the case of systematic four-beam computation, while a non-systematic eight-beam computation gives ~ 1 7 % decrease. The changes in the observed fringe spadngs due to the variation of the diffraction conditions are consistent with the calculated results. © 1973 Oxford University Press. All rights reserved.
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页码:329 / 336
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