NEW PHOTORESIST FOR HIGH RESOLUTION TWO-LAYER RESIST SYSTEMS.

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作者：
Tanaka, Akinobu [1 ]
Morita, Masao [1 ]
Onose, Katsuhide [1 ]
机构：
[1] NTT, Polymer Section, Ibaraki, Jpn, NTT, Polymer Section, Ibaraki, Jpn
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| 1600年 / 24期
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