Comparison of two-wave mixing-self-focusing in diffusion- and drift-type photorefractive materials

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Vaupel, M. [1 ,2 ]
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[1] Phys.-Technische Bundesanstalt, 38116 Braunschweig, Germany
[2] Universite Pierre et Marie Curie, Laboratoire Kastler Brossel/Case 74, 4 Place Jussieu, 75252 Paris Cedex, France
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页码:731 / 736
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