Technical thin film formation methods in low temperature plasma

被引：0
|
作者：
Montasser, Kadry I. [1 ]
Mohamed, Osama I. [1 ]
机构：
[1] Al-Azhar Univ, Cairo, Egypt
来源：
Conference Record - IEEE Instrumentation and Measurement Technology Conference | 1994年 / 2卷
关键词：
Low temperature plasma - Silicon substrate - Thin film formation;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：483 / 486
相关论文
共 50 条
  • [1] Low temperature thin oxide film formation by microwave excitation high density plasma direct oxidation
    Kaihara, R
    Hirayama, M
    Ohmi, T
    PROCEEDINGS OF THE INTERNATIONAL SYMPOSIUM ON THIN FILM MATERIALS, PROCESSES, RELIABILITY, AND APPLICATIONS: THIN FILM PROCESSES, 1998, 97 (30): : 223 - 230
  • [2] Zirconia thin film preparation by wet chemical methods at low temperature
    Popovici, Mihaela
    de Graaf, Jan
    Verschuuren, Marc A.
    Graat, Peter C. J.
    Verheijen, Marcel A.
    THIN SOLID FILMS, 2010, 519 (02) : 630 - 634
  • [3] Production of low electron temperature ECR plasma for thin film deposition
    Itagaki, N
    Ueda, Y
    Ishii, N
    Kawai, Y
    SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 546 - 550
  • [4] Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
    Lee, Young-Soo
    Han, Ju-Hwan
    Park, Jin-Seong
    Park, Jozeph
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (04):
  • [5] Plasma deposition and interface control in low temperature processing of thin film solar cells
    Jagannathan, B
    Anderson, WA
    THIN-FILM STRUCTURES FOR PHOTOVOLTAICS, 1998, 485 : 31 - 36
  • [6] APPLICATIONS OF LOW-TEMPERATURE RF PLASMA ETCHING TO THIN-FILM TECHNOLOGY
    JACOB, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C87 - C87
  • [7] ENHANCED PLASMA OXIDATION AT LOW-TEMPERATURE USING A THIN SOLID ELECTROLYTE FILM
    GOURRIER, S
    DIMITRIOU, P
    THEETEN, JB
    PERRIERE, J
    SIEJKA, J
    CROSET, M
    APPLIED PHYSICS LETTERS, 1981, 38 (01) : 33 - 35
  • [8] Atmospheric-pressure low-temperature plasma processes for thin film deposition
    Kakiuchi, Hiroaki
    Ohmi, Hiromasa
    Yasutake, Kiyoshi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (03):
  • [9] LOW-TEMPERATURE COMPOUND FORMATION IN CU/SN THIN-FILM COUPLES
    CHOPRA, R
    OHRING, M
    OSWALD, RS
    THIN SOLID FILMS, 1982, 94 (04) : 279 - 288
  • [10] Studies on the formation of source and drain in low temperature polycrystalline silicon thin film transistors
    Lee, Yong Woo
    Yang, Gui Fu
    Reddy, A. Mallikarjuna
    Byun, Chang Woo
    Son, Se Wan
    Yun, Seung Jae
    Joo, Seung Ki
    CURRENT APPLIED PHYSICS, 2013, 13 : S182 - S185
12345