Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers

被引：0
|
作者：
Chen, F.H. [1 ]
Ng, V. [1 ]
Adeyeye, A.O. [1 ]
机构：
[1] Info. Storage Materials Laboratory, Department of Electrical Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576, Singapore
来源：
Journal of Applied Physics | 2003年 / 93卷 / 10 2期
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摘要：
(Edited Abstract)
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页码：6605 / 6607
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