Resist elution study for immersion lithography

被引：0
|
作者：
Sato, Mitsuru [1 ]
Yoshida, Masaaki [1 ]
Ishizuka, Keita [1 ]
Tsuji, Hiromitsu [1 ]
Endo, Kotaro [1 ]
机构：
[1] Advanced Material Development Division-1, R and D, Tokyo Ohka Kogyo Co., Ltd., 1590 Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2005年 / 44卷 / 7 B期
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页码：5803 / 5806
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