Relaxation to hopping conductivity in sulfur-doped hydrogenated amorphous silicon

被引:0
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作者
Yoon, Jong-Hwan [1 ]
Taylor, P.C. [1 ]
机构
[1] Univ of Utah, Salt Lake City, United States
来源
Journal of Non-Crystalline Solids | / 227-230卷 / Pt A期
关键词
Activation energy - Amorphous silicon - Electric conductivity of solids - Relaxation processes - Semiconducting films - Thermal effects;
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摘要
Hydrogenated amorphous silicon-sulfur alloy (a-SiSx:H) films were rapidly cooled to a temperature at which electrical conduction is normally achieved by a hopping process. In the rapidly cooled state of sulfur-doped hydrogenated amorphous silicon (a-SiS:H) with approximately 0.5 at.% S, the conductivity follows the activated process that dominates at higher temperatures. With time at low temperatures, the conductivity gradually increases and the mechanism is probably hopping conduction. The time dependence of this increase in conductivity is consistent with a stretched-exponential function with a thermal activation energy of about 0.2±0.1 eV and a stretched-exponential exponent of approximately 0.8 independent of temperature.
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页码:385 / 388
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