Hole pattern fabrication using halftone phase-shifting masks in KrF lithography

被引：0
|
作者：
机构：
[1] Otaka, Akihiro
[2] Kawai, Yoshio
[3] Matsuda, Tadahito
来源：
Otaka, Akihiro | 1600年 / 32期
关键词：
Masks;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] HOLE PATTERN FABRICATION USING HALF-TONE PHASE-SHIFTING MASKS IN KRF LITHOGRAPHY
    OTAKA, A
    KAWAI, Y
    MATSUDA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12B): : 5880 - 5886
  • [2] Effect of lens aberration on hole pattern fabrication using halftone phase-shifting masks
    Otaka, A
    Kawai, Y
    Sakakibara, Y
    PHOTOMASK AND X-RAY MASK TECHNOLOGY IV, 1997, 3096 : 298 - 307
  • [3] Monolayer halftone phase-shifting mask for KrF excimer laser lithography
    Iwabuchi, Yohko, 1600, (32):
  • [4] Sub-quarter micron logic-gate-pattern fabrication using halftone phase-shifting masks
    NTT System Electronics Lab, Kanagawa, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 12 B (7504-7511):
  • [5] Sub-quarter micron logic-gate-pattern fabrication using halftone phase-shifting masks
    Otaka, A
    Kawai, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (12B): : 7504 - 7511
  • [6] Imaging characteristics of multi-phase-shifting and halftone phase-shifting masks
    Terasawa, Tsuneo, 1600, (30):
  • [7] FABRICATION OF PHASE-SHIFTING MASKS WITH SHIFTER OVERCOAT
    KOSTELAK, RL
    GAROFALO, JG
    SMOLINSKY, G
    VAIDYA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3150 - 3154
  • [8] Simulation and fabrication of attenuated phase-shifting masks: CrFx
    Kim, E
    Hong, S
    Kim, KS
    Jiang, ZT
    Kim, DW
    Lim, S
    Woo, SG
    Koh, YB
    No, K
    APPLIED OPTICS, 1997, 36 (28): : 7247 - 7256
  • [9] A proposal of a composite phase-shifting mask for 0.15-μm hole-pattern delineation using KrF exposure
    Hasegawa, N
    Hayano, K
    Imai, A
    Asai, N
    Okazaki, S
    OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 522 - 531
  • [10] Design of phase-shifting masks for enhancing resolution of images in optical lithography
    Li, ZY
    Yang, GZ
    Dong, BZ
    Gu, BY
    Zhang, GQ
    OPTIK, 1998, 108 (04): : 165 - 173
12345